<<
>>

Working out of a breadboard model of installation for synthesis of disorder semiconductors

The breadboard model of installation for synthesis of disorder semiconductors for making of phase storage should answer following parametres:

- Thickness of made films Zo-JuOnm,

- The control of concentration of a dope,

- Not to suppose allocation in atmosphere of liquid and gaseous substances;

- Not to suppose additional pollution of a material in the course of cultivation;

- To provide pozharo - and explosion safety.

Thus, the breadboard model should include all necessary equipment and, probably, the software, allowing to yield operations of synthesis of films HSP and their dopings.

For working out of a breadboard model of installation following problems have been put and solved:

1. The analysis of the up-to-date installations or the separate units, allowing to gain thin films of composition GST225, and as the solution of a question on necessity of making of new hardware solutions;

2. The analysis available in RGRTU and on platforms of partners of high school of instrumental datum and comparison of performances of the available equipment with demanded for reception of thin films of the given composition and a thickness.

3. Working out of the plan of connection and linking of the fitted equipment and the solution of a question on completion program and the hardware.

The analysis of the up-to-date means in the field of making of thin films has shown, that the most extensive distribution have reached installations using following methods of drawing of films:

- Thermovacuum (resistive) transpiration,

- Electron transpiration,

magnetronnoe a pulverisation;

- Laser transpiration (ablation).

The further analysis of the equipment of manufacturers, such as DCA Instruments, Carl

Zeiss C⅛oup, APS Inc, Angstrom Engineering Inc, Robvac, Mantis Deposition, Izovac, Oxford Instruments Plasma Technology, PVD Products and pr has shown, that a number most
Widespread installations have the certain restrictions, not allowing to use them in the course of reception of thin films.

So the installations realising electron transpiration, for example DCA Instruments Е300, have difficulties with maintenance of uniformity of a thickness and stehiometrii on products of the difficult configuration.

Installations of laser transpiration (ablation) (nair PVD Products PLD 3000) basically possess necessary for reception of thin films by properties, for example, allow to gain coats of the difficult linkings and thus possessing high cleanliness. However the given installations are difficult in embodying and consequently have high enough price.

Magnetronnoe the pulverisation is one of the most widespread types of reception of thin films, however, installations have rather high cost. Thus, the specified installations frequently allow to implement and resistive transpiration therefore, the similar complex has high cost in comparison with analogues (e.g. a complex magnetronnogo a pulverisation and thermovacuum transpiration CS - 1000 Sputter &PVD Deposition System firms Asia Pacific Systems Inc)

Thermovacuum (resistive) transpiration concerns the most simple methods of reception of thin films. Installations of similar type allow to reach high velocity of sedimentation of films From the subzero moments it is necessary to score reception of films having insufficient density and low mechanical properties.

In too time, making of devices of phase storage does not provide the appendix to films HSP how many or major efforts therefore, considering cost of similar hardware and instrumental solutions, in given NIR for reception of thin films GST-225 installation of thermovacuum transpiration will be used.

For reception of structure Ge-Sb-Te of a various composition vacuum installation УВН-2М-2 intended for a vacuum resistive dusting of thin films was used.

Installation consists of vacuum system, podkolpachnogo the device and an electrical case of guidance.

C the help of vacuum pumps pumps out air from the closed space - of working volume (PO) vacuum installation.

In the conditions of a fine vacuum (10-5 - 10-6 mm.rt.st. ~ 1,33 (10-3 - 10-4 pases the material placed in the evaporator, heats up and volatilised in a direction to a substrate.

Atoms (molecules) of volatilised substance dvizhutsja to a substrate where are condensed, forming a film. Growth rate of a film, its structure are spotted by the technological
In process parametres, basic of which the transpiration temperature, substrate temperature, pressure of residual gas, the molecular mass of volatilised substance and its nature are. Matter as well geometrical parametres of constructive devices PO.

For dope entering installation magnetronnogo dusting unip - 900 was used, manufactures NPF "Alan-expert" The dusting on a target occurred in the environment of an argon.

УНИП-900 It is intended for drawing:

- nanokompozitnyh strengthening coats wide a lateral view, raising firmness of a surface of a product to deterioration.

- The protectively-decorative coats exchanging galvaniku and representing structural coats nanokompozitnoj of ceramics

The installation equipment can be conventionally parted on vacuum, technological and auxiliary.

The vacuum subsystem is intended for carrying out of operation of a pumping-out of the working cabinet. Consists of two steps forvakuumnogo the pump, bajpasnogo and forvakuumnogo valves, the diffusion pump, a vacuum shutter. All pumps are drived by means of electromagnetic actuators, valves and a shutter have electropneumatic guidance, their standing is checked by means of electromagnetic data units. Water for cooling of the diffusion pump is checked by means of the channel data unit. There are emergency interlocks on a current and temperature. To check pressures in vacuum mains, there are the data units, allowing to spend measurings of vacuum to 0.001 Pases.

The technological subsystem is intended for carrying out of various technological operations. Consists of magnetrons and zaslonok, power units, valves of delivery of gas, controllers of the rate of flux of gas, a drive unit of gyration of products, pressure data units.

Auxiliaries for the control of pressure and a channel of water, pressure of air for a pneumoequipment food.

The original structure of guidance has been developed for the solution of problems of a doping of films HSP in the course of operations on breadboard model making and auxiliary ON, allowing to change base options of the industrial controller for reception of the requirements necessary for doping GST-225

The control system has been constructed under the two-level plan:

Upper - the dispatching program of guidance of installation;

Inferior - the software of the controller of the inferior level.

The inferior level is constructed on the basis of the industrial controller, it provides guidance of all devices of vacuum and technological parts of installation, guidance of power units of magnetrons, allows to spend independently technological process after a fill of its parametres from top level.

The top level is constructed on the basis of the personal computer controllabled OS Linux, and provides communication with the inferior level, konfigurirovanie, recording of operation of installation, indication of failures, dispatching guidance. Communication between levels is carried out on interface RS485

The dispatching program of guidance of the vacuum installation, realised on Python 2.7 realises following functions:

Mapping of critical devices of processes of operation vacuum and the process equipment, a deduction of values of the basic working parametres - pressures, currents and voltages, rates of flux. Mapping of a current state and emergencies

- Adjustment of thresholds of pressures for switching of pumps, valves and vysokovakuumnogo an installation shutter.

- Adjustment of parametres of testing natekanija and prorolling.

- Adjustment of working parametres of technological process.

- Support of communication with the installation controller, fill tehprotsessa, parametres of the unit in the controller, reception from the controller of current states, parametres of operation of the equipment, failures.

- Delivery of commands on start of a pumping-out, start tehprotsessa

- Delivery of commands on a stopping, end tehprotsessa.

- Delivery of commands on end of operation of installation.

- Carrying out of measurings of parametres of the unit - natekanija and prorolling.

- Magazine conducting tehprotsessa

Magazines, options and records are stored in a DB under control of Postgressql.

The breadboard model function chart is presented fig. 4.1

The software of the controller of the inferior level provides:

Fig. 4.1 Function chart of a breadboard model

Self-acting carrying out of operations on preparation, a pumping-out of the working cabinet and carrying out of operations of technological process, tracing of a state of the equipment, formation and processing of signals of failure, guidance of power supplies of magnetrons, delivery of the given currents by them and voltages, processing of signals of emergency states of power supplies of magnetrons, checks target voltages and currents. In case of a diversion of a current or a radiant voltage on 20 % from preset values, the corresponding emergency conferring is shaped, its processing is yielded.

The control of quantity of the energy donated a magnetron.

Guidance vacuum and the installation process equipment, reception of commands and two-sided information interchange about the top level personal computer, transmission of current state variables of the equipment and a course of technological process.

As the plan of linkings and the breadboard model connections, presented on fig. 4.2 has been developed.

Thus, developed in given NIR the breadboard model, includes:

Installation УВН-2М-2 intended for a vacuum resistive dusting of thin films;

Installation magnetronnogo dusting unip - 900; the specialised software for guidance unip - 900.

Fig. 4.2 Plan of linkings and breadboard model connection

4.2.

<< | >>
A source: Baturkin Sergey Aleksandrovich. EXAMINATION of CURRENT PERFORMANCES HALKOGENIDNYH STEKLOOBRAZNYH of SEMICONDUCTORS of COMPOSITION GST-225 ALLOYED by NITROGEN And BOHR. The dissertation on competition of a scientific degree of the candidate of physical and mathematical sciences. Tver - 2015. 2015

More on topic Working out of a breadboard model of installation for synthesis of disorder semiconductors:

  1. Chapter 3. Working out of mathematical model of physical processes in disorder semiconductors of structure GST-225 and models of file JAEFP
  2. Reception of the observational samples of not alloyed and alloyed disorder semiconductors.
  3. Effects of research trials of the observational samples of not alloyed and alloyed disorder semiconductors.
  4. Chapter 4. Carrying out of experimental researches of samples of not alloyed and alloyed disorder semiconductors of composition GST-225.
  5. CHAPTER 5. Research of process of synthesis melamina izkarbamida on pilot installation
  6. Mathematical model for management synthesis vertikalizatsiej ekzoskeleta
  7. CHAPTER 6. Working out of recommendations on trial installation
  8. Chapter 2. Working out of a mathematical model of optimisation of parametres of processing of working cylindrical surfaces of pins of mills
  9. 3.1 Synthesis of the block diagramme of the device defazzifikatsii on the basis of model of the relation of the squares.
  10. Chapter 8. FEATURES of the CONDITION of the IMMUNE STATUS of WORKING WOMEN AT INFLUENCE of COMPONENTS of SYNTHESIS of KARBAMIDNO-FORMALDEHYDE PITCH
  11. Working out of genetic algorithms for synthesis of control systems vertikalizatsiej ekzoskeleta means nejrosetevyh production engineering
  12. Moiseyev IRINA DMITRIEVNA. WORKING out of the CATALYST And TECHNIQUE of SYNTHESIS MELAMINA. DISSERTATSIJAna competition of the scientist stepenikandidata tehnicheskihnauk. Novomoskovsk -, 2002 2002
  13. 2.1 Working out of model of functioning of a transport subsystem
  14. 3.1 Working out of model of process of drying in BSU.